TALYS ADP300 series

Dual channel wet process analyzer

Affordable high-performance wet bath monitoring analyzer addressing semiconductor industry needs. This dual channel analysis system, is a state-of-the-art analyzer suited for real-time, batch-type, or single-wafer tool monitoring of wet etching, cleaning, or photoresist (PR) removal processes.

Overview

The TALYS ADP300 series is an evolution of the well known and proven TALYS ASP300 single-channel analysis system, but with improved key performances and two simultaneous measurements.

It provides semiconductor, FPD, and solar-cell manufacturing with superior performance at a cost suitable for today’s tightening budgets.

The dual channel analysis system, is a state-of-the-art analyzer suited for real-time, batch-type, or single-wafer tool monitoring of wet etching, cleaning, or photoresist (PR) removal processes. This low cost, high-performance wet bath monitor allows real-time measurement at process temperature with unique non-contact sampling system design enabling real time dosing and end of bath alerts (no delay time due to sample conditioning).                                                                                                                                                                    

Features and benefits

• Lowest cost of ownership

• Minimal footprint

• Measures two sampling points simultaneously

• One single analyzer suitable for measuring multiple chemistries with on-the fly calibration switching

• Unique sampling accessory (ClippIR+) enables non-intrusive measurements and allows system installation without stopping and modifying the tool.

• Low maintenance cost: light source to be replaced only every 5 years

Flexibility and performance

This reliable analyzer offers the standard RCA cleaning suite bath prediction configuration. Its flexibility permits bath configuration changes for monitoring chemistry from solar-cell, FPD, and semiconductor manufacturing.

TALYS performance permits equipment operators and engineers to reduce chemical usage and minimize excursion events with real-time bath component predictions.