EMERSONOvation™ VHF Power Delivery System Leading power technology to enable advanced dielectric etch and PVD processes

Benefits

Broadens process windows

Expands process capabilities

Improves plasma characteristics

Increases etch rate, selectivity, 

and uniformity

Reduces CoO 

The Ovation™ fully integrated, VHF power delivery system enables faster, higher 

precision for demanding narrow-linewidth dielectric etch processes. It is the first to 

accurately deliver power into a non-50-Ω environment without an external sensor, 

reacting faster than traditional power supplies. The 60-MHz power delivery reduces 

voltage potential across the plasma sheath, minimizing ion etch damage, and thus 

improving film quality and yields. Its embedded measurement technology enables 

previously unavailable insight into chamber plasma parameters and performance.

Features

2760 W, 60 MHz (contact factory 

for higher power requirements)

Sweep frequency

Non-50 Ω measurement 

capability 

Analog, RS-232, and Ethernet 

control options 

Smaller footprint—half-rack 

option for power up to 2.7 kW

Highly stable and reliable

Expert applications support

Improves Film 

Quality and Yields

As process geometries continue to 

shrink with decreasing metal widths 

and line spaces, the Advanced Energy®

Ovation VHF power-delivery system 

offers an innovative solution to help 

you achieve desirable properties in sub90-nm dielectric etch, HDP-CVD, and 

PECVD processes. Critical dimensions 

and narrow linewidths require 

stable and accurate power-delivery 

systems with higher-than-traditional 

frequencies. The unique technology 

in the Ovation power-delivery system 

allows you to optimize your processes 

with enhanced VHF power delivery 

and measurement. Further, 60-MHz 

technology reduces voltage potential 

across the plasma sheath, minimizing 

ion etch damage and thus improving 

film quality and yields.

Broadens Process 

Windows 

This advanced, very high frequency 

power technology enables you to 

expand your process window over 

a wide VSWR load range with output 

powers up to 4.5 kW at frequencies 

of 60 MHz. 

Developed to meet the demanding 

requirements of advanced etch 

processes, the Ovation VHF powerdelivery system accurately and 

efficiently delivers the optimal power 

required into a wide VSWR window, 

up to 3:1. The system’s unique powerdelivery scheme offers the highest 

power efficiency and power density 

commercially available—in a compact, 

half-rack unit—nearly half the size 

of competing systems for power 

requirements up to 2.7 kW.

Expands Process Capabilities

The Ovation system’s power platform ensures stable performance, reliable 

operation, improved overall film characteristics, and increased yields—

even at the 65-nm range.

Expanded process capabilities include:

• Quick power system compensation for plasma load changes due 

to process step transitions

• Accurate measurement and power delivery outside of 50 Ω

The Ovation power system is specifically designed to expand the tight process 

windows constraining advanced etch processes by providing the capabilities 

for users to drive higher plasma densities, with a wide operating range and 

unmatched transient response.

Improves Plasma Characteristics

To avoid device damage, as smaller gate structures become the norm, processes 

must run at lower-than-traditional voltages. High-frequency power systems readily 

enable these low-voltage processes. Process developers who contend with these issues 

have found that high-frequency systems provide such tangible benefits as:

• Increased plasma density for etch and CVD applications

• Reduced process-induced damage in etch applications 

Higher Etch Selectivity 

and Etch Rates

Today’s demanding, narrow-linewidth, 

dielectric etch processes require rapid 

power supply responses to transitions 

between process steps. The Ovation 

power-delivery solution ensures 

consistent and repeatable performance. 

Its VHF power-delivery system is the 

first to accurately deliver power into a 

non-50-Ω environment, allowing the 

Ovation generator to react faster than 

traditional power supplies.

This fully integrated power-delivery 

system enables faster, higherprecision processes such as those 

required for sub-90- and sub-65-

nm etch applications, through the 

implementation of a unique powerdelivery scheme. This scheme results in:

• Higher etch rates

• Higher yields and film quality 

on processes with precision control 

between transition process steps

• More efficient power transfer

Enhanced Power 

Measurement System

The Ovation power-delivery 

solution features embedded advanced 

measurement technology, including 

internal impedance measurement. 

A non-50-Ω measurement capability 

facilitates previously unavailable 

insights into chamber plasma 

parameters and performance. 

The system also offers embedded 

power instrumentation for 

real-time data mining

Optional Equipment

Compact and Versatile for