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AMAT  0090-76109   RF Matching / Capacitor Assembly
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AMAT 0090-76109 RF Matching / Capacitor Assembly

AMAT  0090-76109   RF Matching / Capacitor Assembly

¥7150.00
¥6520.00
¥6520.00
¥6520.00
Weight:2.000KG
Description

AMAT  0090-76109   RF Matching / Capacitor Assembly


AMAT 0090-76109 is a high-performance precision component manufactured by Applied Materials (AMAT).

It is a specialized RF (Radio Frequency) Match Network or Capacitor Assembly component, primarily utilized in the power delivery systems of semiconductor processing tools like the Centura, Endura, and Producer platforms.

Introduction

The AMAT 0090-76109 plays a critical role in plasma-enhanced semiconductor processes.

In systems such as PECVD (Plasma Enhanced Chemical Vapor Deposition) or Etch, the delivery of RF power must be perfectly matched to the impedance of the plasma chamber to ensure stable ion bombardment and film uniformity.

This component is engineered to handle high-voltage RF signals, providing the necessary capacitance or tuning stability required to maintain a consistent plasma discharge during wafer processing.

Technical Parameter Table

The following specifications define the operational profile for the 0090-76109 RF component:

FeatureSpecification
ManufacturerApplied Materials (AMAT)
Part Number0090-76109
Component TypeRF Matching / Capacitor Assembly
Material ConstructionHigh-Purity Ceramic / Silver-Plated Copper
Cooling MethodConvection / Heat Sink Compatible
RF Frequency RangeTypically 13.56 MHz (Standard Industrial RF)
Voltage RatingHigh-Voltage RF Optimized
System CompatibilityProducer, Centura, and Endura Platforms

Related Models

The 0090-76109 is often integrated within broader RF delivery systems alongside:

AMAT 0010-XXXXX: RF Match Box Assemblies.

AMAT 0190-XXXXX: RF Generators and Power Supplies.

AMAT 0040-XXXXX: Pedestal and Cathode assemblies that receive the RF signal.

Application Cases

Plasma Etching: Ensuring precise power delivery to the plasma for uniform removal of material across 300mm wafers.

Dielectric Deposition: Stabilizing the RF field during the growth of insulating layers to prevent film defects or "arcing."

RF Match Tuning: Used as a replacement part during the refurbishment of automated match networks (AMNs) to restore tuning speed and accuracy.

Product Advantages and Features

Low Loss Tangent: Constructed with high-grade dielectric materials to minimize power dissipation and heat generation.

Extreme Stability: Engineered to maintain constant capacitance values even under the thermal stress of continuous 24/7 Fab operations.

Precision RF Shielding: Designed to minimize EMI (Electromagnetic Interference) with surrounding sensitive control electronics.

OEM Reliability: As a genuine Applied Materials part, it ensures the "Phase and Magnitude" of the RF signal remain within the tight tolerances required by the tool's software.

Other Models in the Same Series

AMAT 0090-76108: (Lower capacitance variant)

AMAT 0090-76110: (High-power configuration)

AMAT 0090-05124: (Legacy RF matching component)

Vibro   meterIOCN   200-566-000-113
VIBRO METERVM600   MPC4 200-510-111-034
     200-510-070-113
Vibro-meterVM600   CMC16
Vibro-meterVM600   RPS6U
Vibro-Meter444-680-000-511
Vibro-meterVM600-ABE040   204-040-100-011
Vibro-meter600-003   620-001-001-116 VM600 XMV16
Vibro-meter620-002-000-113   620-003-111-112 VM600 XI016T
Vibro-meter200-560-000-018   200-560-101-015  VM600 IOC4T
Vibro-meter620-002-000-113   620-003-111-112 VM600 XIO16T
Vibro-meterVM600   RLC16

Installation and Maintenance

Safety Warning: RF components can retain significant residual charge. Ensure all RF generators are locked out and tagged out (LOTO) before service.

Cleanliness: Hand oils can cause "hot spots" on RF components. Always use clean, lint-free gloves during installation.

Torque Specs: Ensure all RF strap connections are tight. Loose connections in an RF path can lead to localized heating, arcing, and catastrophic failure of the match box.

Calibration: After replacement, a "Match Tune" calibration should be performed via the tool interface to ensure the automated tuning range is centered.

Unique Product Description

The AMAT 0090-76109 is the "tuning fork" of the plasma chamber. In the high-stakes world of sub-10nm logic and memory manufacturing, the ability to strike and maintain a perfect plasma is the difference between a functional chip and a wasted wafer.

This component provides the electrical precision necessary to bridge the gap between the RF generator and the process environment

 For maintenance engineers looking to eliminate "Reflected Power" issues and improve "Time to Tune," the 0090-76109 is a critical asset for maintaining peak tool performance.


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